Semiconductor

Spin dryer

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"Spin dryer" is used for drying after wet cleaning process without using any chemicals.
Waterresidue on wafers are removed by the effects of centrifugal force and air flow caused on the surface of wafers by spinning
We have two types: "Vertically rotating type" and "Horizontally revolving type".
 

Features

● Corresponding to process up to 300mm wafers

● Possible to process maximum 4 carriers simultaneously by "Horizontally revolving type"

● Possible to process carrierless wafers by "Vertically rotating type" 

● Prevent the occurence of the particle by special sealing mechanism

● ULPA filter and Ionaizer are equipped as standard